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国際会議ISE2018に参加しました．4/15-18,2018

早稲田大学にて開催された国際会議ISE2018-22nd Topical Meeting of the International Society of Electrochemistryに参加し当研究室の学生4名がポスター発表を行いました．
また助教2名が口頭発表致しました．
内容は以下の通りです．

Haochun Tang, "Pulse Current Electrodeposition of Ultrahigh Strength of Nanocrystalline Au-Cu Alloys"

Takahiro Yamamoto, "Effects of Current Density on Mechanical Properties of Electroplated Nickel with High Speed Sulfamate Bath"

Ken Hashigata, "Electroplating of Gold on Titanium Substrate: Method to Deposit Defect-Free Film"

Wan-Ting Chiu, "Co-deposition of Ni-P and P25 on Silk Textile by Supercritical CO? Promoted Electroless Plating for Flexible Photocatalyst Applications"

Chun-Yi Chen, "Anodization of Ti-Nb-Ta-Zr-O Mixed-oxides Nanotube Arrays: A Promising Alternative Photoelectrode for Solar Conversion"

Tso-Fu Mark Chang, "Hydro-Baric Effect on Cathodic Deposition of Titanium Dioxide and Tin Dioxide"

Chun-Yi Chen, "Electroplated Au-based Materials with High Micro-mecchanical Properties as MEMS accelerometer Components"

Hao-chun Tang, "Micro-Mechanical Property Evaluation of Electroplated Au?Cu Alloys toward Applications in MEMS Accelerometers"

Tso-Fu Mark Chang, "FEM Simulation on Structure Stability of Ti/Au Multi-Layered Cantilevers with Various Dimensions for Applications as Movable Structures in MEMS Devices"

山本貴大君(M2)	唐浩峻君(D3)
Ken Hashigata君（M2）	邱琬婷さん(D3)
集合写真